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A method of removing impurities on a grinding surface of a thinned semiconductor wafer for producing a highly reliable semiconductor device is provided even when the thickness of a semiconductor chip is thinned. After grinding the back surface of the semiconductor wafer, the impurities on the grinding surface are removed by sandblast processing.
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27-3-2008 · A method of removing impurities on a grinding surface of a thinned semiconductor wafer for producing a highly reliable semiconductor device is provided even when the thickness of a semiconductor chip is thinned. After grinding the back surface of the semiconductor wafer, the impurities on the grinding surface are removed by sandblast processing.
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Previous Next. View Larger Image. Metallurgical Content Grinding Uranium Ore. containing 50 gms. per liter of uranium values is pumped through an 18″ filter press for removal of iron and titanium impurities and then sent to the precipitation section. The impurities sludge is returned to the leach agitators.-Remove Iron Impurities In Uranium ...
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Grinding (abrasive cutting) - Wikipedia
Creep-feed grinding (CFG) was invented in Germany in the late 1950s by Edmund and Gerhard Lang. Unlike normal grinding, which is used primarily to finish surfaces, CFG is used for high rates of material removal, competing with milling and turning as a manufacturing process choice.
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